Since the first edition was published in 2008 atomic layer deposition ald has emerged as a powerful and sometimes preferred deposition technology the new edition of this groundbreaking monograph is the first text to review the subject of ald comprehensively from a practical perspective. Atomic layer deposition ald is a vapor phase technique capable of producing thin films of a variety of materials based on sequential self limiting reactions ald offers exceptional conformality on high aspect ratio structures thickness control at the angstrom level and tunable film composition. Here is a new ald book edited by jeannie valdez atomic layer deposition ald fundamentals characteristics and industrial applications to be published by nova in the 4th quarter 2015 editors jeannie valdez book description atomic layer deposition ald is a thin film deposition technique used in the mass production of microelectronics. Atomic layer deposition ald is a thin film deposition technique based on the sequential use of a gas phase chemical process it is a subclass of chemical vapour depositionthe majority of ald reactions use two chemicals called precursorsthese precursors react with the surface of a material one at a time in a sequential self limiting manner. Atomic layer deposition ald is a thin film deposition technique used in the mass production of microelectronics in this book novel nonvolatile memory devices are discussed the chapters examine the low temperature fabrication process of single crystal platinum non thin films using plasma enhanced atomic layer deposition peald
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